In a conventional plasma etching chamber, the incident ions bombard the surface and etch holes normal to the surface; angled etching is not possible even when the surface is tilted. To overcome ...

Both capacitively (RIE) and inductively (ICP) coupled plasma etcher with fluorine-based gases (CF4, CHF3, C4F8, SF6), BCl3, nitrogen, argon, and oxygen for anisotropic dry etching of Si-based ...

This groundbreaking technique, also referred to as MacEtch or MACE, provides ultra-high anisotropy etching that’s free from damage. It is an innovative approach that effectively addresses the ...

The researchers compared results from this process to a more advanced cryo-etching process that uses hydrogen fluoride gas to create the plasma. "Cryo etch with the hydrogen fluoride plasma showed ...

The energetic ions in the plasma are accelerated towards the sample surface by a negative self-bias voltage that develops on the substrate. This ion bombardment enhances the chemical reactions at the ...

This room also has the following resources: The Trion ICP/RIE Etch PHTII-4301 (TRION) is a reactive ion etcher with the addition of a inductively coupled plasma to achieve a high density plasma for ..

A new technical paper titled “Understanding and Optimizing Oxygen Plasma Treatment for Enhanced Cu-Cu Bonding Application” ...

Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND ...

The discovery was partially accidental, as researchers happened upon it while looking at using high-energy plasma etching to machine the surface of wood in order to improve it’s water resistance.

Advancements and Projections in the Global DC Plasma Excitations Market: Insights, Trends, Opportunities, and Recent DevelopmentsNew York, Jan. 27, 2025 (GLOBE NEWSWIRE) -- Overview The Global DC ...