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Plasma technique doubles etch rate for 3D NAND flash memoryTo store ever more data in electronic devices of the same size, the manufacturing processes for these devices need to be ...
To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...
Micro-electronic circuit wafers are typically manufactured using plasma etch reactors. Manufacturing is accomplished by depositing layers of conducting or insulating material onto a silicon wafer and ...
The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a ...
This includes three dry etchers with a range of capabilities, while characterization tools include an ellipsometer, FTIR, and wafer curvature system. This room also has the following resources: The ...
Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The PlasmaPro 100 Cobra ICP RIE system ...
This effect is also known as Plasma Induced Damage. The discharging of accumulated charges, which is done through the thin gate oxide of the transistor, it might cause damage to the transistors and ...
The Global Semiconductor Wafers Market was valued at approximately USD 18.53 billion in 2022 and is projected to grow at a healthy CAGR of more than 4.8% during the forecast perio ...
As its name implies, RIE uses a plasma of highly reactive ions ... reactive fluorine ions are attracted to the wafer, where they attack and etch away the surfaces that aren’t protected by ...
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